ARRAY SUBSTRATE FOR IMAGE DISPLAY DEVICE, AND ITS MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a manufacturing method of an array substrate for a liquid crystal device capable of preventing a defect due to a leak at a gate oxidation film and enhancing yield. SOLUTION: An etching rate of an undercoat layer 4 to hydrofluoric acid is made to be lower than that of a glass substrate 3. The undercoat layer 4 is formed in the state where particles P adhere onto the glass substrate 3. An amorphous silicon film is formed on the undercoat layer 4. Even if the surface of the amorphous silicon film is cleaned by using hydrofluoric acid, an abnormal part is not formed in the amorphous silicon film and a glass hole is not formed in the glass substrate 3. Abnormal growth of a polysilicon thin film 5 and the gate oxide film 6 associated with adhesion of the particles P onto the glass substrate 3 can be prevented. COPYRIGHT: (C)2005,JPO&NCIPI