| 发明名称 |
Basic compound, resist composition and patterning process |
| 摘要 |
Resist compositions comprising basic compounds having an imidazole skeleton and a polar functional group have an excellent resolution and an excellent focus margin and are useful in microfabrication using electron beams or deep-UV light.
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| 申请公布号 |
US2004234884(A1) |
申请公布日期 |
2004.11.25 |
| 申请号 |
US20040849186 |
申请日期 |
2004.05.20 |
| 申请人 |
WATANABE TAKERU;KINSHO TAKESHI;HASEGAWA KOJI |
发明人 |
WATANABE TAKERU;KINSHO TAKESHI;HASEGAWA KOJI |
| 分类号 |
C07D233/54;C07D233/60;C07D405/06;C09K3/00;G03F7/004;G03F7/038;G03F7/039;H01L21/027;(IPC1-7):G03C1/76 |
主分类号 |
C07D233/54 |
| 代理机构 |
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代理人 |
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