| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To accurately analyze the composition of foreign matter or a defect on a specimen. <P>SOLUTION: This electron beam analyzer is equipped with a secondary electron detector for detecting secondary electrons generated from the specimen by electron beam irradiation, a specimen image forming part for forming a specimen image based on an output of the electron detector, and an X-ray detector for detecting X rays generated from the specimen by the electron beam irradiation. Element analysis on foreign matter/defect is performed by using the X-ray detector to detect X rays generated when irradiating electron rays to the foreign matter/defect existing on a surface of the specimen. The shape of the foreign matter or defect 37 is extracted to set an electron beam irradiation area 38 within the shape. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
