| 摘要 |
PROBLEM TO BE SOLVED: To provide a production method of a sulfonium salt compound useful as a resist acid generator or a photocationic polymerization initiator and a photoradical polymerization initiator, which can be economically carried out on an industrial scale, excels in general purpose properties, and is safe and inexpensive. SOLUTION: The method for producing the sulfonium salt compound represented by formula (1) (wherein Ar is an aryl residue; X is a halogen substituted in Ar; n is an integer of 1-7; and Z is an anion other than a halide ion) comprises reacting an aryl halide compound with a compound represented by formula (2) (wherein Y<SP>1</SP>and Y<SP>2</SP>are each a halogen or the like) in the presence of a Lewis acid, stopping the reaction with water in the post treatment step of the reaction, collecting the aqueous layer from a two layer-separated reaction mixture, subjecting the aqueous layer to an extraction treatment with an organic solvent to remove by-products by extraction, adding a salt compound to the aqueous layer after the extraction treatment to crystallize a sulfonium salt compound as a crystal, and isolating the crystal by solid-liquid separation. COPYRIGHT: (C)2009,JPO&INPIT
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