| 摘要 |
PROBLEM TO BE SOLVED: To provide a resin composition and its cured product for a resistance element pattern and the like, which can be developed with water, have good pattern accuracy, cause a little residue of organic matter after heating and baking, and have excellent adhesive properties. SOLUTION: The resin composition and its cured product comprise (A) a polymer of a specific structure obtained by using a compound, as a raw material, represented by formula (1) (wherein R<SB>1</SB>is hydrogen or a methyl group; R<SB>2</SB>is hydrogen or an alkyl group; n is an integer of 2-10), (B) a diluent, (C) a photopolymerization initiator, and (D) at least one selected from among a metallic powder, a metal oxide, and glass. COPYRIGHT: (C)2005,JPO&NCIPI
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