发明名称 Copper-alloy interconnection layer
摘要 The present invention provides an electrically conductive layer comprising a copper alloy which includes at least one of Ag, As, Bi, P, Sb, Si, and Ti in the range of not less than 0.1 percent by weight to not more than a maximum solubility limit to copper, so that the copper alloy is in a solid solution and/or which includes at least one of Mo, Ta and W in a range of not less than 0.1 percent by weight to not more than 1 percent by weight.
申请公布号 US6818991(B1) 申请公布日期 2004.11.16
申请号 US20000584739 申请日期 2000.06.01
申请人 NEC ELECTRONICS CORPORATION 发明人 KIKUTA KUNIKO
分类号 H01L21/3205;H01L23/52;H01L23/532;(IPC1-7):H01L23/48 主分类号 H01L21/3205
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