| 摘要 |
PROBLEM TO BE SOLVED: To provide a parallel-line type mask which has an extremely small variation in stripe width, i.e., in parallel pitch of monofilament yarns and maintains the parallel pitch with high accuracy, in a parallel-line type mask having fine pitch using the monofilament yarns. SOLUTION: The mask is formed by extending and fixing the monofilament yarns composed of either of synthetic fiber, natural fiber or metallic fiber into grooves arranged at prescribed pitch in non-opening parts of a planar substrate having an opening. COPYRIGHT: (C)2005,JPO&NCIPI
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