发明名称 DEVICE AND METHOD FOR MEASURING PHOTOELECTRIC FIELD
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a photoelectric field measuring device and photoelectric field measuring method capable of measuring with high sensitivity, the electric field in a measuring cavity where a high voltage is impressed. <P>SOLUTION: The photoelectric field measuring device 1 generates an incidence light for introducing in an optical waveguide arranged in a measuring cavity, and based on the interference light between reflection lights which are reflected from a first branch incidence light and a second branch incidence light branched from the incidence light, the electric field generated in the measuring cavity is measured. The device comprises a semiconductor laser LD3, LiNbO<SB>3</SB>crystal substrate 11, PIN (p-i-n) photodiode PD5, electric field measuring circuit 7 and an optical coupler 9. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号 JP2004317341(A) 申请公布日期 2004.11.11
申请号 JP20030112640 申请日期 2003.04.17
申请人 NIPPON HOSO KYOKAI <NHK> 发明人 ISHIKAWA TADASHI;ONOZAWA HIROCHIKA;FUJITANI IKUSHI;ISHIKAWA TAKAYUKI;NAKAMURA RUI
分类号 G01R15/24;G01R29/08;G01R29/12;G02F1/035;(IPC1-7):G01R29/08 主分类号 G01R15/24
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