发明名称 Manufacture of planar waveguides using sol-gel techniques
摘要 Silica sol techniques are described for making thick silica or silica based films useful for planar optical waveguides. The process involves coating of a colloidal silica sol onto a substrate, drying the sol, and consolidating the dried sol to form the planar waveguide. Coating is performed in a simple operation, either by dipping, or preferably by spin coating. In a preferred embodiment the substrate is coated with a wetting agent prior to spin coating. It is found that the wetting agent substantially improves the thickness uniformity of the layer. Thick waveguide layers may be produced by repeating the coating process one or more times to produce a layer with the desired thickness. Buried waveguides are produced by forming a doped core layer, patterning the doped core layer and using the coating technique of the invention to form the cladding material.
申请公布号 US2004221619(A1) 申请公布日期 2004.11.11
申请号 US20020196678 申请日期 2002.07.16
申请人 BHANDARKAR SUHAS;DU HENRY;JOHNSON DAVID WILFRED;KIM DEOK-YANG;KOWACH GLEN R. 发明人 BHANDARKAR SUHAS;DU HENRY;JOHNSON DAVID WILFRED;KIM DEOK-YANG;KOWACH GLEN R.
分类号 C23C18/12;C23C20/06;C23C26/00;C23C28/04;G02B6/12;(IPC1-7):C03B19/12 主分类号 C23C18/12
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