| 摘要 |
PROBLEM TO BE SOLVED: To provide an aligning method capable of mitigating the dispersion of integrated exposure even when illumination conditions are largely changed. SOLUTION: The aligning method successively transfers the pattern of a mask to the mask while synchronously scanning the mask and a reticle in a state of irradiation with pulse-like exposure light. By defocusing a fixed blind 14 to a conjugate plane CJ2 optically conjugate with a reticle surface, the illuminance distribution of the exposure light in a direction corresponding to a scanning direction is turned to a trapezoidal distribution with a slope within the conjugate plane CJ2. When the width of the slope becomes extremely narrow at the time of changing the illumination conditions, the defocus amount G of the fixed blind 14 or the like to the conjugate plane CJ2 is changed. Also, instead of changing the defocus amount, the minimum pulse number of the exposure light to irradiate an optional point on a wafer is changed. COPYRIGHT: (C)2005,JPO&NCIPI
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