发明名称 SUBSTRATE PROCESSING EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To enhance parallelism of a fork in a substrate carrier for carrying a wafer while holding on the fork between the carrier and a wafer boat. SOLUTION: A wafer carrying mechanism 4 constituting a substrate carrier comprises forks 41 arranged in a plurality of stages for holding a plurality of wafers W to advance/retract freely toward/from a movable carrying body 5, an adjusting plate 71 being secured to the base end side of the fork 41, a mechanism 6 for adjusting the arranging interval of the adjusting plate 71, a member 72 for holding the base end side of the adjusting plate 71 and having the base end side being secured to the arranging interval adjusting mechanism 6, and wafer sensors 82 and 83 provided on the adjusting plate 71 in order to detect a wafer held by the fork 41 wherein parallelism of the fork is adjusted by securing the adjusting plate 71 to the holding member 72 while adjusting inclination using first and second screws. Parallelism of a supporting member can be adjusted finely by adjusting vertical inclination of the supporting member through an inclination adjusting mechanism between the arranging interval adjusting mechanism 6 and the supporting member and thereby parallelism of the supporting member can be enhanced. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004311821(A) 申请公布日期 2004.11.04
申请号 JP20030105249 申请日期 2003.04.09
申请人 TOKYO ELECTRON LTD 发明人 KOYAMA KATSUHIKO
分类号 H01L21/677;H01L21/67;H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/677
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