发明名称 |
MICRO THERMAL PROCESSING ELECTRODE AND THERMAL PROCESSING METHOD USING IT FOR METAL MEMBER OR SEMICONDUCTOR MEMBER |
摘要 |
PROBLEM TO BE SOLVED: To provide a micro thermal processing electrode and a thermal processing method using it, capable of microprocessing a metal member or a semiconductor member to be thermally processed. SOLUTION: An alloy formed of Ni, Fe or Co metal or at least two or more selected from them is taken as a base material of a negative electrode, the tip part of a wire-like base material 2 is polished thinner to obtain a radius of curvature ranging from 10 nm order to 10μm order at the tip by electrolytic-polishing. A carbon nanotube 3 is coated at least on an electrode function part (the tip part) of the base material 2 by plasma CVD (chemical vapor deposition) method. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2004306162(A) |
申请公布日期 |
2004.11.04 |
申请号 |
JP20030099706 |
申请日期 |
2003.04.02 |
申请人 |
OSAKA INDUSTRIAL PROMOTION ORGANIZATION |
发明人 |
HIRATA YOSHINORI;OCHI HISAYOSHI |
分类号 |
B23H1/04;C23C16/26;(IPC1-7):B23H1/04 |
主分类号 |
B23H1/04 |
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