发明名称 MICRO THERMAL PROCESSING ELECTRODE AND THERMAL PROCESSING METHOD USING IT FOR METAL MEMBER OR SEMICONDUCTOR MEMBER
摘要 PROBLEM TO BE SOLVED: To provide a micro thermal processing electrode and a thermal processing method using it, capable of microprocessing a metal member or a semiconductor member to be thermally processed. SOLUTION: An alloy formed of Ni, Fe or Co metal or at least two or more selected from them is taken as a base material of a negative electrode, the tip part of a wire-like base material 2 is polished thinner to obtain a radius of curvature ranging from 10 nm order to 10μm order at the tip by electrolytic-polishing. A carbon nanotube 3 is coated at least on an electrode function part (the tip part) of the base material 2 by plasma CVD (chemical vapor deposition) method. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004306162(A) 申请公布日期 2004.11.04
申请号 JP20030099706 申请日期 2003.04.02
申请人 OSAKA INDUSTRIAL PROMOTION ORGANIZATION 发明人 HIRATA YOSHINORI;OCHI HISAYOSHI
分类号 B23H1/04;C23C16/26;(IPC1-7):B23H1/04 主分类号 B23H1/04
代理机构 代理人
主权项
地址