发明名称 Semiconductor device and method for manufacturing the same
摘要 A low elasticity layer (20) having an opening in an electrode arranging area where element electrodes are disposed is provided on a main surface of a semiconductor substrate (10). On the low elasticity layer (20), lands (32) serving as external electrodes are disposed, and pads (30) on the element electrodes, the lands (32) and metal wires (31) for connecting them are integrally formed as a metal wiring pattern (33). A solder resist film (50) having an opening for exposing a part of each land (32) is formed, and a metal ball (40) is provided on the land (32) in the opening. The low elasticity layer (20) absorbs thermal stress and the like caused in heating or cooling the semiconductor device, so as to prevent disconnection of the metal wires (31).
申请公布号 US6812573(B2) 申请公布日期 2004.11.02
申请号 US20010886971 申请日期 2001.06.25
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 SHIMOISHIZAKA NOZOMI;SAHARA RYUICHI;NAKAMURA YOSHIFUMI;KUMAKAWA TAKAHIRO;MURAKAMI SHINJI;HARADA YUTAKA
分类号 H01L23/12;H01L23/31;H01L23/485;(IPC1-7):H01L23/48 主分类号 H01L23/12
代理机构 代理人
主权项
地址