发明名称 |
Method and apparatus for calibrating marking position in chip scale marker |
摘要 |
A method and apparatus for calibrating a marking position in a chip scale marker are provided. The method includes: (a) placing a screen which is equivalent in shape to the wafer on a wafer holder for holding the wafer; (b) irradiating a laser beam at a predetermined target point on the screen, and measuring the position of the laser beam by a camera being moved above the target point; (c) transmitting the measured position information to a controller; (d) repeating steps (b) and (c) at a plurality of predetermined points; (e) comparing the transmitted position information with the target point; and (f) calibrating the position of the laser beam irradiated on the wafer by adjusting mirrors of the galvano scanner in the event that a deviation between the position information and the target point falls beyond a predetermined value.
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申请公布号 |
US6808117(B2) |
申请公布日期 |
2004.10.26 |
申请号 |
US20020138257 |
申请日期 |
2002.05.06 |
申请人 |
EO TECHNICS CO., LTD. |
发明人 |
HAN YOU-HIE;LEE CHOONG-SHIN;MIN YANG-GHI;AHN BYOUNG-MIN;CHANG HYEYG-JEON |
分类号 |
G02B5/02;B23K26/00;H01L21/00;H01L21/02;H01L21/68;H01L23/544;H01S3/00;H01S3/16;(IPC1-7):G06K19/06 |
主分类号 |
G02B5/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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