发明名称 IMPROVED SIMULTANEOUS MULTI-SPOT INSPECTION AND IMAGING
摘要 A multi-spot inspection system employs an objective (30) for focusing an array of radiation beams (24) to a surface of an object (28) and a second objective (32) having a large numerical aperture for collecting scattered radiation (64) from the array of illuminated spots. The scattered radiation from each illuminated spot is focused to a corresponding optical fiber channel (34) so that information about a scattering may be conveyed to a corresponding detector in a remote detector array (36) for processing. For patterned surface inspection, a cross-shaped filter (90) is rotated along with the surface to reduce the effects of diffraction by Manhattan geometry. A spatial filter (92) in the shape of an annular aperture may also be employed to reduce scattering from patterns such as arrays on the surface.
申请公布号 WO03089872(A3) 申请公布日期 2004.10.21
申请号 WO2003US12070 申请日期 2003.04.18
申请人 KLA-TENCOR TECHNOLOGIES CORPORATION 发明人 VAEZ-IRAVANI, MEHDI;MILLER, LARRY
分类号 G01N21/88;G01N21/956 主分类号 G01N21/88
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