发明名称 FILM FORMING METHOD FILM FORMING APPARATUS, ARRANGEMENT METHOD AND APPARATUS FOR LIQUID CRYSTAL LIQUID CRYSTAL APPARATUS AND MANUFACTURING METHOD FOR THE SAME, AND ELECTRONIC EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To provide a film forming method and a film forming apparatus, by which a uniform coating film can be formed on a substrate aiming at reducing dropping marks. SOLUTION: The film forming apparatus 10 discharges a liquid material as a drop, and the drop impacts on the substrate 20 at a predetermined pitch P1 to form a coating film on the substrate 20. The predetermined pitch P1 is decided based on the diameter L1 after the impact of the drop on the substrate 20. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004290961(A) 申请公布日期 2004.10.21
申请号 JP20040033600 申请日期 2004.02.10
申请人 SEIKO EPSON CORP 发明人 HIRUMA TAKASHI
分类号 G02F1/13;B05C5/00;B05D1/26;B05D5/06;G02F1/1337;G02F1/1341;(IPC1-7):B05D1/26;G02F1/133;G02F1/134 主分类号 G02F1/13
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