发明名称 |
FILM FORMING METHOD FILM FORMING APPARATUS, ARRANGEMENT METHOD AND APPARATUS FOR LIQUID CRYSTAL LIQUID CRYSTAL APPARATUS AND MANUFACTURING METHOD FOR THE SAME, AND ELECTRONIC EQUIPMENT |
摘要 |
PROBLEM TO BE SOLVED: To provide a film forming method and a film forming apparatus, by which a uniform coating film can be formed on a substrate aiming at reducing dropping marks. SOLUTION: The film forming apparatus 10 discharges a liquid material as a drop, and the drop impacts on the substrate 20 at a predetermined pitch P1 to form a coating film on the substrate 20. The predetermined pitch P1 is decided based on the diameter L1 after the impact of the drop on the substrate 20. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2004290961(A) |
申请公布日期 |
2004.10.21 |
申请号 |
JP20040033600 |
申请日期 |
2004.02.10 |
申请人 |
SEIKO EPSON CORP |
发明人 |
HIRUMA TAKASHI |
分类号 |
G02F1/13;B05C5/00;B05D1/26;B05D5/06;G02F1/1337;G02F1/1341;(IPC1-7):B05D1/26;G02F1/133;G02F1/134 |
主分类号 |
G02F1/13 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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