发明名称 POSITIVE TONE BI-LAYER IMPRINT LITHOGRAPHY METHOD AND COMPOSITIONS THEREFOR
摘要 The present invention provides a method and compositions to pattern a substrate that features creating a multi-layered structure by forming, on the substrate, a patterned layer having protrusions and recessions. Formed upon the patterned layer is a conformal layer, with the multi-layered structure having a crown surface facing away from the substrate. Portions of the multi-layered structure are removed to expose regions of the substrate in superimposition with the protrusions, while forming a hard mask in areas of the crown surface in superimposition with the recessions.
申请公布号 WO2004088414(A2) 申请公布日期 2004.10.14
申请号 WO2004US08920 申请日期 2004.03.24
申请人 MOLECULAR IMPRINTS, INC. 发明人 SREENIVASAN, SIDLGATA, V.;XU, FRANK, Y.;MILLER, MICHAEL, N.;WATTS, MICHAEL, P.C.
分类号 G03F;G03F7/00;G03F7/09 主分类号 G03F
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