发明名称 |
POSITIVE TONE BI-LAYER IMPRINT LITHOGRAPHY METHOD AND COMPOSITIONS THEREFOR |
摘要 |
The present invention provides a method and compositions to pattern a substrate that features creating a multi-layered structure by forming, on the substrate, a patterned layer having protrusions and recessions. Formed upon the patterned layer is a conformal layer, with the multi-layered structure having a crown surface facing away from the substrate. Portions of the multi-layered structure are removed to expose regions of the substrate in superimposition with the protrusions, while forming a hard mask in areas of the crown surface in superimposition with the recessions. |
申请公布号 |
WO2004088414(A2) |
申请公布日期 |
2004.10.14 |
申请号 |
WO2004US08920 |
申请日期 |
2004.03.24 |
申请人 |
MOLECULAR IMPRINTS, INC. |
发明人 |
SREENIVASAN, SIDLGATA, V.;XU, FRANK, Y.;MILLER, MICHAEL, N.;WATTS, MICHAEL, P.C. |
分类号 |
G03F;G03F7/00;G03F7/09 |
主分类号 |
G03F |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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