DEVICE FOR ELONGATING LIFETIME OF STENCIL MASK

摘要

PROBLEM TO BE SOLVED: To elongate the life of a stencil mask, in a device for mask ion beam lithography.

SOLUTION: The device 1 for mask ion beam lithography is equipped with a mask maintaining module 6 for elongating the life of the stencil mask 31. The module 6 is provided with a deposit means for depositing a material ds at the side of the mask irradiated by a lithography beam 1b while arranging at least one set of a deposit source before the mask 31. The device 1 is further provided with a spatter means, in which at least one set of a spatter source, arranged before a mask holder means 32 and at the outside of the route of the lithography beam 1b, produces a spatter ion beam sb sent to the mask to beat out the material from the mask 31 during scanning procedure and compensate the inhomogeneity of the deposit.

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