| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus, in which a processing liquid can be uniformly supplied to a substrate, and at the same time, the miniaturization, space saving and cost reduction can be designed. SOLUTION: The substrate 200 is supported by a roller shaft 400 and transfer rollers 40, and spraying pipes 2 and 2a to which the processing liquid is supplied are arranged in parallel and rotatably by supporting members 12 and 13 above the substrate 200. The spraying pipe 2 is provided with a spray nozzle 1, and the spraying pipe 2a is provided with spray nozzles 1a and 1b which have respectively a different discharging angle. The spray nozzles 1, 1a and 1b discharge the processing liquid while swinging. COPYRIGHT: (C)2005,JPO&NCIPI
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