PECVD DEVICE AND CLEANING METHOD THEREOF

摘要

PURPOSE: A PECVD(Plasma Enhanced Chemical Vapor Deposition) device and a cleaning method thereof are provided to increase the efficiency of a cleaning chamber by connecting one cleaning chamber with a plurality of chambers. CONSTITUTION: A plurality of process chambers form a thin film. A catalytic chamber(407) includes a hot wire part(415) capable of generating a high temperature, and resolves a cleaning gas. A cleaning gas conveying path(411) conveys the cleaning gas generated in the catalytic chamber to the process chambers, and connects the catalytic chamber with the process chambers.