发明名称 METHOD FOR MANUFACTURING CAPACITOR FOR IMPROVING FATIGUE OF FERROELECTRIC FILM
摘要 PURPOSE: A method for manufacturing a capacitor is provided to improve fatigue phenomenon by implanting oxygen or ozone ions into a conductive layer on a lower electrode using plasma treatment having low energy. CONSTITUTION: A base lower electrode composed of Ir(203) and IrO2(205) is formed on a substrate(201) with a desired structure. A conductive layer(207) is formed on the base lower electrode, thereby forming a lower electrode. The surface of the conductive layer is reformed by implanting oxygen or ozone ions(208) using plasma treatment having low energy of 0.5-1.0 KeV. Then, a ferroelectric film(209) is formed on the resultant structure. An upper electrode composed of IrO2(211) and Ir(213) is formed on the ferroelectric film. The resultant structure is annealed.
申请公布号 KR20040087197(A) 申请公布日期 2004.10.13
申请号 KR20030021469 申请日期 2003.04.04
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 HUH, JANG EUN;JU, SEOK HO
分类号 H01L27/105;(IPC1-7):H01L27/105 主分类号 H01L27/105
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