| 摘要 |
An exposure apparatus (EX) exposes a substrate (P) by projecting an image of a predetermined pattern on the substrate through a liquid (1). The exposure apparatus has a projection optical system for the projection and a liquid-feeding mechanism (10) for feeding a liquid on to the substrate to form a liquid-immersed region (AR2) on part of the substrate. The liquid-feeding mechanism feeds the liquid (1) on to the substrate (P). The feeding is simultaneously made at positions away to different directions from a projection region (AR1). The exposure apparatus has capability of stably forming the liquid-immersed region and of excellently recovering the liquid, so that outflow of the liquid to the periphery of the region is prevented and accurate exposure is performed. |
