发明名称 BEAM SOURCE AND BEAM TREATMENT DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a beam source and a beam treatment device capable of uniformly irradiating various beams like positive ion, negative ion, neutral particles or the like on a treated object in a large ion current density and in a large diameter, and realizing a large caliber and longer life of a grid electrode. <P>SOLUTION: Provided with a means for leading in gas, a positive and negative ion plasma generating means generating a state in which the positive ion and the negative ion are mixed through plasmolyzation of gas, a positive and negative ion generating chamber generating positive and negative ion, and a plurality of grid electrodes equipped with a plurality of beam-drawing-out holes, the device draws out ion or beams neutralized from the ion through the beam-drawing-out holes fitted to the grid electrodes by accelerating the positive ion or the negative ion through impression of voltage between the plurality of electrodes. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004281232(A) 申请公布日期 2004.10.07
申请号 JP20030071073 申请日期 2003.03.14
申请人 EBARA CORP;UNIV TOHOKU 发明人 ICHIKI KATSUNORI;SHIBATA AKIO;FUKUDA AKIRA;HIYAMA HIROKUNI;YAMAUCHI KAZUO;SAGAWA SEIJI
分类号 B01J3/00;B01J19/12;H01J27/02;H01J27/16;H01J37/08;H01L21/3065;H01S3/00;H05H1/46 主分类号 B01J3/00
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