Producing conductive layers

摘要

A method for fabricating molecular electronic devices (10) comprising at least a bottom electrode (14) and a molecular switch film (16) on the bottom electrode (14), includes forming the bottom electrode (14) by a process including: cleaning (36b) portions of the substrate (12) where the bottom electrode (14) is to be deposited; pre-sputtering (36c) the portions; depositing (36d) a conductive layer (14) on at least the portions; and cleaning (36g) the top surface of the conductive layer (14). The conductive electrode (14) properties include: low or controlled oxide formation (or possibly passivated), high melting point, high bulk modulus, and low diffusion. smooth deposited film surfaces are compatible with Langmuir-Blodgett molecular film deposition. Tailored surfaces are further useful for SAM deposition. The metallic nature gives high conductivity connection to molecules. Barrier layers may be added to the device stack, i.e. Al 2 O 3 over the conductive layer (14).