METHOD FOR FABRICATING WIRE METAL OF LCD FOR PREVENTING DATA OPEN REJECT

摘要

PURPOSE: A method for fabricating wire metal of an LCD is provided to improve the adhesion characteristics of Mo for forming source/data wire metal with respect to photoresist and the patterning characteristics in wet etching, thereby reducing the data open caused by the pattern reject. CONSTITUTION: A method for fabricating wire metal of an LCD includes the steps of forming a MoO2 layer on the surface of a wire metal(Mo) layer(120) after forming the wire metal layer on a glass substrate(100). After removing the native oxide layer by heat treatment under hydrogen atmosphere of about 450°C for about 15 minutes, a pure Mo layer is remaining on the surface of the wire metal layer. By carrying out heat treatment under oxide atmosphere of about 325°C for about 10 minutes, new MoO3 layer is formed on the Mo layer. The MoO3 layer is returned to MoO2 layer(140) by carrying out heat treatment under hydrogen atmosphere of about 400°C for about 10 to 15 minutes.