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发明名称
聚焦与感光式微透镜阵列之制法
摘要
聚焦与感光式微透镜阵列之制法,主要包括:一、预备步骤;二、曝光成型步骤;三、导电层成型步骤;四、复制翻模步骤;五、微透镜成型步骤;六、成品步骤。本发明利用光学微影之近接式曝光法,在光罩与光阻层之间隔一预定空隙,经曝光与显影后,得以形成微透镜阵列,再加以电铸成形为模具,供日后量产。其兼具精密度高且生产成本低、制程稳定及应用范围广等各种优异效果;尤其,以不同的间隔部让紫外线光源产生不同的绕射现象,并以不同的间距照射于光阻层而产生特定几何外形之微透镜阵列,可应用于各式微米领域的科技产品中。
申请公布号
TW200419188
申请公布日期
2004.10.01
申请号
TW092107224
申请日期
2003.03.27
申请人
国立中兴大学
发明人
杨锡杭
分类号
G02B3/00;H01L27/14
主分类号
G02B3/00
代理机构
代理人
赵元宁
主权项
地址
台中市南区国光路二五○号
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