| 摘要 |
PROBLEM TO BE SOLVED: To provide equipment for measuring aberration in which wave aberration can be measured with high accuracy regardless of the aberration of an optical system. SOLUTION: The equipment for measuring wave aberration of an optical system using a light passed through the optical system comprises a first mask generating a wavefront including wave aberration of the optical system and a spherical wave from that light, a second mask generating a wavefront including wave aberration of the optical system from that light, and a means for switching the first and second masks. COPYRIGHT: (C)2004,JPO&NCIPI
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