发明名称 SOLID-STATE IMAGING DEVICE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a solid-state imaging device having satisfactory noise and read characteristics by improving the noise and read characteristics with enhanced balance. SOLUTION: In the solid-state imaging device, an electrode 8 for reading signal charges is provided at one side of a light reception sensor 11 for composing pixels, a specific voltage signal V is applied to a shielding film 9 that is formed while covering portions other than the light reception sensor section 11 in an imaging region, a second-conductivity-type semiconductor region 6 is formed at the center on the surface of a first-conductivity-type semiconductor region 2 for composing the photoelectric conversion region of the light reception sensor 11, and regions 10 (10A, 10B) whose impurity concentration is lower than the second-conductivity-type semiconductor region 6 are formed at the end of the side of the electrode 8 on the surface of the first-conductivity-type semiconductor region 2 and the end of the side of a pixel separation region 3 at the opposite side. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004273640(A) 申请公布日期 2004.09.30
申请号 JP20030060328 申请日期 2003.03.06
申请人 SONY CORP 发明人 KITANO YOSHIAKI;ABE HIDEJI;KUROIWA ATSUSHI;HIRATA KIYOSHI;OKI HIROAKI;KARASAWA NOBUHIRO;TAKIZAWA RITSUO;YAMASHITA MITSURU;SATO MITSURU;KOKUBU KATSUNORI
分类号 H01L27/148;H01L27/146;H04N5/335;H04N5/357;H04N5/369;H04N5/372;(IPC1-7):H01L27/148 主分类号 H01L27/148
代理机构 代理人
主权项
地址
您可能感兴趣的专利