| 摘要 |
PROBLEM TO BE SOLVED: To provide an electronic beam focusing device and an electronic beam projection lithography system adopting the same, which can form uniform electromagnetic field between a wafer and an electronic beam emitter and can minimize the distortion phenomenon of an electronic beam path by the vibration of a vacuum chamber. SOLUTION: The electronic beam projection lithography system, which disposes an wafer 130 with predetermined interval so as to face an electronic beam emitter 120 within the vacuum chamber 110 and emits electronic beam towards the wafer, is equipped with the electronic beam focusing device which has upper and lower magnets 161, 162 which are arranged on the outsides of upper and lower sides of vacuum chamber respectively and form magnetic field within the vacuum chamber, upper and lower pole pieces 171, 172 provided so as to penetrate through top and bottom walls of the vacuum chamber respectively and magnetically contacted with the upper and lower magnets respectively, and upper and lower projection parts 191, 192 projected in a ring shape on mutually facing surfaces of the upper and lower pole pieces respectively. And the electronic beam projection lithography system controls the path of the electronic beam. COPYRIGHT: (C)2004,JPO&NCIPI
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