发明名称 Semiconductor laser device and method of manufacturing same
摘要 In a semiconductor laser device having a quantum well active layer, an undoped thin spacer layer is formed between an undoped optical guide layer and a p-type cladding layer. The thickness of the spacer layer is preferably 5 nm or more but less than 10 nm. The spacer layer absorbs impurities diffusing thereinto from the p-type cladding layer. Thus, the dopant is prevented from being diffused into the undoped optical guide layer.
申请公布号 US6798808(B1) 申请公布日期 2004.09.28
申请号 US20000492803 申请日期 2000.01.28
申请人 SHARP KABUSHIKI KAISHA 发明人 KONUSHI FUMIHIRO;OHKUBO NOBUHIRO;KAWATO SHINICHI
分类号 H01S5/343;H01S5/323;(IPC1-7):H01S5/00 主分类号 H01S5/343
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