发明名称 METHOD OF GROWING CHEMICAL COMPOUND SEMICONDUCTOR
摘要 <P>PROBLEM TO BE SOLVED: To provide a chemical compound semiconductor having proper crystallinity and low resistivity, not obtained before in a GaN compound semiconductor, and its manufacturing method, and to provide a semiconductor light-emitting element, which is excellent in an electric property and an optical property, employing this compound semiconductor. <P>SOLUTION: The manufacturing method is to supply either material of P, As, or Sb to In<SB>x</SB>Ga<SB>y</SB>Al<SB>1-x-y</SB>N layer(0&le;x, y&le;1) simultaneously and to supply a dopant. In the compound semiconductor manufactured like this, a compressive strain is imposed on a crystal and an expansive strain, in the crystal, caused from a void of nitrogen can be relaxed, therefore, the manufactured compound semiconductor is a proper compound semiconductor superior in a crystallinity of less lattice defect. <P>COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004266285(A) 申请公布日期 2004.09.24
申请号 JP20040084816 申请日期 2004.03.23
申请人 SHARP CORP 发明人 HOSOBANE HIROYUKI;SUYAMA NAOHIRO;YOSHIDA TOMOHIKO;KANEIWA SHINJI;KONDO MASAFUMI;HATA TOSHIO;OBAYASHI TAKESHI
分类号 H01L21/205;H01L33/32;H01S5/323 主分类号 H01L21/205
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