| 发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which significantly shows the effect of properties when a pattern with high color density or a black matrix pattern in a black color is formed by using a photosensitive resin composition containing a coloring agent of high concentration. <P>SOLUTION: The photosensitive resin composition contains a compound (E) expressed by formula (1). <P>COPYRIGHT: (C)2004,JPO&NCIPI |
| 申请公布号 |
JP2004264728(A) |
申请公布日期 |
2004.09.24 |
| 申请号 |
JP20030056808 |
申请日期 |
2003.03.04 |
| 申请人 |
SUMITOMO CHEM CO LTD |
发明人 |
NAKAI HIDEYUKI;INOUE MASAHITO;MURO SEIJI |
| 分类号 |
G03F7/004;C08F2/50;G02B5/00 |
主分类号 |
G03F7/004 |
| 代理机构 |
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