发明名称 Method for fabricating a microelectromechanical system (MEMS) device using a pre-patterned bridge
摘要 A method for fabricating MEMS structures includes etching a recess in either an upper surface of a substrate that is bonded to a wafer that ultimately forms the MEMS structure, or to the lower surface of the wafer that is bonded to the substrate. Accordingly, once the etching processes of the wafer are completed, the recess facilitates the release of an internal movable structure within the fabricated MEMS structure without the use of a separate sacrificial material. Furthermore, a bridge, which is preferably insulating, is pre-etched before the wafer is attached to the substrate.
申请公布号 US6794271(B2) 申请公布日期 2004.09.21
申请号 US20010967157 申请日期 2001.09.28
申请人 ROCKWELL AUTOMATION TECHNOLOGIES, INC. 发明人 HARRIS RICHARD D.;KRETSCHMANN ROBERT J.
分类号 B81B7/00;B81C1/00;(IPC1-7):H01L21/30;H01L21/00 主分类号 B81B7/00
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