发明名称 Production of material libraries using sputter methods
摘要 In a process for the combinatorial production of a library of materials in the form of a two-dimensional matrix in the surface region of a planar substrate by sputtering, the planar target used for the sputtering is arranged in parallel to the planar substrate and has surface regions of different chemical composition.
申请公布号 US6790322(B2) 申请公布日期 2004.09.14
申请号 US20020149753 申请日期 2002.11.13
申请人 HTE AKTIENGESELLSCHAFT THE HIGH THROUGHPUT EXPERIMENTATION COMPANY 发明人 SCHUNK STEPHAN A.;DEMUTH DIRK;HIBST HARTMUT
分类号 B01J19/00;C23C14/34;C40B30/08;C40B40/18;C40B60/14;(IPC1-7):C23C14/34 主分类号 B01J19/00
代理机构 代理人
主权项
地址