发明名称 |
Preparation of stack high-K gate dielectrics with nitrided layer |
摘要 |
Numerous methods for forming various semiconductor structures are disclosed. In one embodiment, a layered dielectric structure of alternating sub-layers of a first dielectric material and a second dielectric material is formed on a suitable semiconductor substrate. In this embodiment, the layered dielectric structure comprises an alternating pattern of at least two sub-layers of a first dielectric material which is a high-K dielectric material and at least one layer of a second dielectric material which is a standard-K dielectric material, wherein at least one of the one or more second dielectric material sub-layers contain nitrogen implanted therein using a nitridation step.
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申请公布号 |
US6790755(B2) |
申请公布日期 |
2004.09.14 |
申请号 |
US20010034163 |
申请日期 |
2001.12.27 |
申请人 |
ADVANCED MICRO DEVICES, INC. |
发明人 |
JEON JOONG |
分类号 |
H01L21/28;H01L29/51;(IPC1-7):H01L21/336 |
主分类号 |
H01L21/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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