发明名称 WASHING METHOD
摘要 PROBLEM TO BE SOLVED: To wash an object to be washed having minute structure with a supercritical fluid by a simple process. SOLUTION: Carbon dioxide in a gaseous state is introduced into a treating chamber from a supply source 20 and pressure and temperature are adjusted to cause direct phase shift to supercritical carbon dioxide from the gaseous carbon dioxide. Then a ternary amine compound is added thereto from a supply source 22. A pressure damping valve 42 is opened and the supercritical carbon dioxide is supplied until the inside of the treating chamber is completely replaced with the supercritical carbon dioxide. The object to be washed is immersed in the supercritical carbon dioxide for a prescribed time to perform washing treatment and foreign matter stuck on the object to be washed is removed. Then supply of the ternary amine compound is stopped and only the supercritical carbon dioxide is supplied to replace the supercritical carbon dioxide with added ternary amine compound with pure supercritical carbon dioxide by supplying only the supercritical carbon dioxide and rinse washing of the object to be washed is performed. Then supply of carbon dioxide is stopped, temperature and pressure in the treating chamber are dropped by discharging the supercritical carbon dioxide in the treating chamber to change carbon dioxide in a gaseous state and drying is performed. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004249189(A) 申请公布日期 2004.09.09
申请号 JP20030040865 申请日期 2003.02.19
申请人 SONY CORP;MITSUBISHI GAS CHEM CO INC 发明人 SAGA KOICHIRO;WATANABE HIROYA;AZUMA TOMOYUKI
分类号 H01L21/302;B08B7/00;C11D7/32;C11D17/00;H01L21/00;H01L21/304;(IPC1-7):B08B7/00 主分类号 H01L21/302
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