| 摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning liquid which can perfectly eliminate, within a short period of time, the etching residues remaining after the dry etching in the wiring process of semiconductor devices or display devices to which a metal wiring is performed for use into a semiconductor integrated circuit and does not oxidate or corrode a copper wiring material and insulation film material or the like. SOLUTION: The cleaning liquid contains nitric acid, sulfuric acid, and fluorine compound. Moreover, concentration of water in which pH value has been adjusted to 3 to 7 through addition of a basic compound is set to 80 wt%. COPYRIGHT: (C)2004,JPO&NCIPI
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