| 摘要 |
PURPOSE: To easily obtain a thin film having extremely little absorption and having enough optical characteristics with a small number of layers by sputtering a target comprising a mixture of inorg. fluoride and fluorocarbon resin to form a thin film on a substrate. CONSTITUTION: A thin film is formed on a substrate by sputtering a target comprising a mixture of inorg. fluoride and fluorocarbon resin. The inorg. fluoride is AlF3 , LiF, MgF2 , CaF2 , SrF2 , BaF2 , Na3 AlF6 or Na5 Al3 F14 or a mixture of these The fluorocarbon resin is polytetrafluoroethylene resin (PTFE), polychloro trifluoro ethylene resin (PCTFE), polyhexafluoro ethylene propylene resin (PFEP), polyvinyl fluoride resin (PVF), or polyvinylidene fluoride resin (PVDF). At least one layer formed by this production method of the optical thin film is formed on a substrate. |
