发明名称 GRAVURE PLATEMAKING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To perform excellent gravure platemaking using a positive thermal resist having necessary and sufficient development latitude without heating a coating film after the film is formed. <P>SOLUTION: A positive photosensitive agent consisting of an alkali soluble positive photosensitive composition having development latitude without heating the coated film after the coating film is formed and sensitivity to a laser in an IR wavelength region is applied onto a roll on which platemaking is to be performed to form a photosensitive film. A positive image of the photosensitive film is exposed to the laser beam in the IR wavelength region, the part of the main chain or the side chain of molecules of a photosensitive film forming resin of the exposed part is cut so that the photosensitive film forming resin of the exposed part is converted into low molecular weight matter having much higher alkali solubility and a latent image appropriately generating scattering of the photosensitive layer is formed. The exposure part of the photosensitive film forming resin is washed out by performing alkali development to leave only the resist of a non-printing element part. <P>COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004240391(A) 申请公布日期 2004.08.26
申请号 JP20030170762 申请日期 2003.06.16
申请人 THINK LABORATORY CO LTD 发明人 SATO TSUTOMU;SHIGETA KAKU;SHIGETA TATSUO
分类号 G03F7/004;B41N1/06;B41N1/20;G03F7/00 主分类号 G03F7/004
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