| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure method capable of easily setting light quantity. SOLUTION: In the exposure method for setting light quantity and exposing a mask pattern on a substrate 100 by getting a shutter blade in and out of an optical path, the sector 14 is operated in such a manner that the speed of the sector 14 when edges 14a, 14b of the sector 14 go out from the inside of the optical path to the outside thereof attains to the maximum speed v1 when getting the sector 14 in and out. COPYRIGHT: (C)2004,JPO&NCIPI
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