发明名称 MEASURING METHOD AND EXPOSURE METHOD
摘要 PROBLEM TO BE SOLVED: To measure the surface shape of a reflection surface highly accurately in a short period of time. SOLUTION: The amount of local rotation of the reflection surface and the amount of rotation of a stage WST are simultaneously measured while the stage WST moves axially substantially in parallel to the reflection surfaces of moving mirrors MX, MY in a two dimensional plane, and the configuration of the reflection surface is calculated using only both of the amount of the local rotation of the reflection surface measured when the stage moves substantially at a constant speed and of the amount of rotation of the stage corresponding to the foregoing amount of the local rotation. Consequently, the configuration of the reflection surface can be accurately measured without being influenced by deformation of the reflection surface caused by acceleration and deceleration of the stage. Further, unlike the case where the stage is positioned, and for every positioning the amount of the local rotation of the reflection surface and the amount of the rotation of the stage are measured, since the positioning of the stage and times of the acceleration and deceleration before and after the positioning become unnecessary during the time till the end of the simultaneous measurement since the starting of the same, shortening of the measurement time becomes possible as a result. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004241666(A) 申请公布日期 2004.08.26
申请号 JP20030030256 申请日期 2003.02.07
申请人 NIKON CORP 发明人 KAMIYA SABURO;KONDO MIYUKI;KANAZUMI YUTAKA;TANAKA MASAJI
分类号 G01B11/00;G03F7/20;H01L21/027;(IPC1-7):H01L21/027 主分类号 G01B11/00
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