process for producing a Si-based alloy sputtering target, sputtering target and its application

摘要

A sputtering target is produced from a silicon-based alloy with an aluminum content of 5-50 wt.% by melting the alloy and vacuum-casting the alloy in a hollow cylindrical casting mold to produce tubular sections (5). An independent claim is also included for a tubular cathode comprising a sputtering target produced by the process.