发明名称 |
Method for fault detection in a plasma process |
摘要 |
A method of fault detection is described for use in a plasma process chamber powered by an RF source and subject to periodic standard preventive maintenance. Prior to a production run, the changes in magnitude of a plurality of Fourier components of the RF source resulting from known changes in a plurality of process conditions are determined and a single parameter which is a linear combination of a selected subset of said components is constructed. The construction is such that the combination is relatively sensitive to pre-selected process changes and relatively insensitive to said standard preventive maintenance. Then, during the production run, the single parameter is monitored to determine if there is a fault in the plasma process.
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申请公布号 |
US6781383(B2) |
申请公布日期 |
2004.08.24 |
申请号 |
US20020295350 |
申请日期 |
2002.11.15 |
申请人 |
SCIENTIFIC SYSTEM RESEARCH LIMITED |
发明人 |
O'LEARY KEVIN;SCANLAN JOHN;O'MORAIN CIARAN |
分类号 |
H01J37/32;(IPC1-7):G01N27/62 |
主分类号 |
H01J37/32 |
代理机构 |
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地址 |
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