发明名称 |
METHOD FOR PURIFYING CRUDE RESIN FOR ELECTRONIC MATERIAL |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for purifying a crude resin for an electronic material by which byproducts such as an oligomer contained in the crude resin for the electronic material are effectively removed; to provide a resin for the electronic material obtained by the purification method; to provide a method for producing a chemical amplification-type photoresist composition by using the resin for the electronic material; and to provide the chemical amplification-type photoresist composition using the resin for the electronic material. <P>SOLUTION: The method for purifying the crude resin for the electronic material having a structural unit derived from a (meth)acrylic ester having a hydrophilic part comprises a step for cleaning the crude resin for the electronic material by using a polar solvent, and a step for cleaning the resin by using a hydrophobic solvent. The resin for the electronic material is obtained by the purification method. The method for producing the chemical amplification type photoresist composition uses the resin for the electronic material, and the chemical amplification type photoresist composition is obtained by using the resin for the electronic material. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
申请公布号 |
JP2004231834(A) |
申请公布日期 |
2004.08.19 |
申请号 |
JP20030023302 |
申请日期 |
2003.01.31 |
申请人 |
TOKYO OHKA KOGYO CO LTD |
发明人 |
HANEDA HIDEO;IWAI TAKESHI;TAKESHITA MASARU;HAYASHI RYOTARO;MUROI MASAAKI;ATSUJI KOTA;TOMITA HIROAKI;SHIOTANI KAZUYUKI |
分类号 |
G03F7/039;C08F6/00;C08F20/28;G03F7/26 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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