发明名称 SOLUTION JETTING APPARATUS AND METHOD FOR JETTING SOLUTION
摘要 PROBLEM TO BE SOLVED: To jet a solution to efficiently deposit it onto only an aimed position with high accuracy. SOLUTION: A transparent substrate 2 having a plurality of surrounded regions surrounded by barrier walls arranged on one surface of the substrate is mounted on a worktable 1. The transparent substrate 2 and the atmosphere above are heated by a heater 68, while a nozzle 65 is cooled by supplying a cooling medium to a cooling medium jacket 69A from a cooling medium supplier 70A, all controlled by a controller 73A. The nozzle 65 and the transparent substrate 2 are relatively moved, the solution in a tank 66 is supplied to the nozzle 65, drops of the solution are continuously jetted from a jetting port 65a, and while the drops are heated, they reach at the surrounded regions of the heated transparent substrate 2. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004230211(A) 申请公布日期 2004.08.19
申请号 JP20030018578 申请日期 2003.01.28
申请人 CASIO COMPUT CO LTD 发明人 SHIMODA SATORU
分类号 B41J2/01;B05C5/00;B05C9/10;B05D1/26;B05D3/02;H01L51/50;H05B33/10;H05B33/14;(IPC1-7):B05C9/10 主分类号 B41J2/01
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