METHOD FOR THE CHEMICAL TREATMENT OF A COPPER-ALLOY SUPPORT FOR ELECTRONIC COMPONENTS OF THE TYPE USED IN THE SEMICONDUCTOR INDUSTRY

摘要

The invention relates to a method for the chemical treatment of a copper-alloy support for electronic components of the type used in the semiconductor industry. The inventive method is characterised in that it consist in successively subjecting the support to the following operations, namely: alkaline cleansing (A); rinsing (B) in demineralised water; soaking (C) in an acid bath; rinsing (B1) in demineralised water; soaking (C1) in an acid solution L1/I which can create a micro-rough surface in the form of a plurality of hollow areas; rinsing (B2) in demineralised water; pre-soaking (C2) in a solution L1/II which can create a film of copper oxidising complexes on the aforementioned micro-rough surface; soaking (C3) in a solution L1/II which can create a film of copper oxidising complexes on the micro-rough surface; rinsing (B3) in demineralised water; soaking (C4) in an acid; rinsing (B4) in demineralised water; and drying (D).