WAFER CLEANING APPARATUS AND CLEANING METHOD THEREOF

摘要

PURPOSE: A wafer cleaning apparatus and a cleaning method thereof are provided to measure floating contaminants on the cleaning solution in a cleaning process and stick the floating contaminants to an electrode plate by using a zeta potential analyzer. CONSTITUTION: A cleaning bath(90) is used for storing a wafer. A zeta potential analyzer(10) is used for measuring zeta potential of contaminants included in a cleaning solution(70) within the cleaning bath. A DC power generator(20) is used for supplying DC to an electrode plate installed on the cleaning bath dependent on the zeta potential of the measured contaminants. A pump(50), a cooler(30), and a filter(60) are used for circulating the cleaning solution within the cleaning bath.