METHODS FOR SILICON OXIDE AND OXYNITRIDE DEPOSITION USING SINGLE WAFER LOW PRESSURE CVD,申请号KR20047010150-传众专利搜索

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发明名称	METHODS FOR SILICON OXIDE AND OXYNITRIDE DEPOSITION USING SINGLE WAFER LOW PRESSURE CVD
摘要
申请公布号	KR20040073520(A)	申请公布日期	2004.08.19
申请号	KR20047010150	申请日期	2002.12.19
申请人		发明人
分类号	C23C16/40;C23C16/42;C23C16/30;C23C16/44;C23C16/455;C23C16/56;H01L21/316;H01L21/318	主分类号	C23C16/40
代理机构		代理人
主权项
地址

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