发明名称 |
TUNNELING MAGNETORESISTIVE DEVICE AND MANUFACTURING METHOD THEREOF |
摘要 |
PURPOSE: A tunneling MR(MagnetoResistive) device and a manufacturing method thereof are provided to improve MR property and thermal stability by using a barrier layer with low roughness and defect, and high uniformity and by controlling the constituent of a barrier layer. CONSTITUTION: A magnetization-orientation fixed layer is deposited on a substrate. An amorphous ZrAl layer is deposited on the magnetization-orientation fixed layer. The amorphous ZrAl layer contains Zr of 2 to 20 %. An amorphous ZrAlOx layer as a barrier layer is formed by exposing the amorphous ZrAl layer to oxygen gas. A magnetization-orientation variable free-layer is deposited on the amorphous ZrAlOx barrier layer.
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申请公布号 |
KR20040069495(A) |
申请公布日期 |
2004.08.06 |
申请号 |
KR20030005915 |
申请日期 |
2003.01.29 |
申请人 |
KOREA CHUNGANG EDUCATIONAL FOUNDATION |
发明人 |
CHOI, CHEOL MIN;LEE, SEONG RAE |
分类号 |
H01L43/08;(IPC1-7):H01L43/08 |
主分类号 |
H01L43/08 |
代理机构 |
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地址 |
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