发明名称 TUNNELING MAGNETORESISTIVE DEVICE AND MANUFACTURING METHOD THEREOF
摘要 PURPOSE: A tunneling MR(MagnetoResistive) device and a manufacturing method thereof are provided to improve MR property and thermal stability by using a barrier layer with low roughness and defect, and high uniformity and by controlling the constituent of a barrier layer. CONSTITUTION: A magnetization-orientation fixed layer is deposited on a substrate. An amorphous ZrAl layer is deposited on the magnetization-orientation fixed layer. The amorphous ZrAl layer contains Zr of 2 to 20 %. An amorphous ZrAlOx layer as a barrier layer is formed by exposing the amorphous ZrAl layer to oxygen gas. A magnetization-orientation variable free-layer is deposited on the amorphous ZrAlOx barrier layer.
申请公布号 KR20040069495(A) 申请公布日期 2004.08.06
申请号 KR20030005915 申请日期 2003.01.29
申请人 KOREA CHUNGANG EDUCATIONAL FOUNDATION 发明人 CHOI, CHEOL MIN;LEE, SEONG RAE
分类号 H01L43/08;(IPC1-7):H01L43/08 主分类号 H01L43/08
代理机构 代理人
主权项
地址