发明名称 ALIGNER
摘要 PROBLEM TO BE SOLVED: To support an exposure structural body with accuracy in a vacuum atmosphere in an aligner wherein a substrate is exposed in a vacuum atmosphere. SOLUTION: In the aligner wherein the substrate is exposed in a vacuum atmosphere, vibration-free mounts 11, 51, and 91 which are formed using metal bellows 59 are installed inside a vacuum chamber 3. The exposure structural body including a mask stage surface plate 6, a wafer stage surface plate 8, a tube surface plate 10, and the like which are placed inside the vacuum chamber is supported by the vibration-free mounts. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004221251(A) 申请公布日期 2004.08.05
申请号 JP20030005890 申请日期 2003.01.14
申请人 CANON INC 发明人 HARA HIROMICHI
分类号 F16F13/20;G03B27/42;G03B27/58;G03B27/62;G03C5/18;G03C5/26;G03F7/20;H01L21/027;(IPC1-7):H01L21/027 主分类号 F16F13/20
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